Power scaling of an extreme ultraviolet light source for future lithography

Wagenaars, Erik orcid.org/0000-0002-5493-3434, Kuepper, Felix, Klein, Juergen, Neff, Willi, Damen, Marcel, van der Wel, Pieter, Vaudrevange, Dominik and Jonkers, Jeroen (2008) Power scaling of an extreme ultraviolet light source for future lithography. Applied Physics Letters. 181501. pp. 1-3. ISSN 0003-6951

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Copyright, Publisher and Additional Information: © 2008 American Institute Physics. This is an author produced version of a paper published in Applied Physics Letters. Uploaded in accordance with the publisher's self-archiving policy.
Keywords: Physics and Astronomy (miscellaneous)
Institution: The University of York
Academic Units: The University of York > Physics (York)
Depositing User: Repository Officer
Date Deposited: 28 Jul 2008 15:00
Last Modified: 14 Aug 2016 00:09
Published Version: http://dx.doi.org/10.1063/1.2924299
Status: Published
Refereed: Yes
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