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Power scaling of an extreme ultraviolet light source for future lithography

Wagenaars, Erik, Kuepper, Felix, Klein, Juergen, Neff, Willi, Damen, Marcel, van der Wel, Pieter, Vaudrevange, Dominik and Jonkers, Jeroen (2008) Power scaling of an extreme ultraviolet light source for future lithography. Applied Physics Letters. 181501. pp. 1-3. ISSN 0003-6951

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Abstract

For future lithography applications, high-power extreme ultraviolet (EUV) light sources are needed at a central wavelength of 13.5 nm within 2% bandwidth. We have demonstrated that from a physics point of view the Philips alpha-prototype source concept is scalable up to the power levels required for high-volume manufacturing (HVM) purposes. Scalability is shown both in frequency, up to 100 kHz, and pulse energy, up to 55 mJ collectable EUV per pulse, which allows us to find an optimal working point for future HVM sources within a wide parameter space. (C) 2008 American Institute of Physics.

Item Type: Article
Copyright, Publisher and Additional Information: © 2008 American Institute Physics. This is an author produced version of a paper published in Applied Physics Letters. Uploaded in accordance with the publisher's self-archiving policy.
Academic Units: The University of York > Physics (York)
Depositing User: Repository Officer
Date Deposited: 28 Jul 2008 15:00
Last Modified: 23 Mar 2014 02:05
Published Version: http://dx.doi.org/10.1063/1.2924299
Status: Published
Refereed: Yes
Related URLs:
URI: http://eprints.whiterose.ac.uk/id/eprint/4090

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