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Growth rate effects in soft CoFe films

Vopsaroiu, M, O'Grady, K, Georgieva, M T, Grundy, P J and Thwaites, M J (2005) Growth rate effects in soft CoFe films. IEEE Transactions on Magnetics. pp. 3253-3255. ISSN 1941-0069

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We report on growth rate effects in sputter-deposited CoFe films prepared using high target utilization sputtering technology (HiTUS). We find that the grain structure of these polycrystalline films is closely related to the growth rate. By changing the growth rate, samples were prepared with different grain structure, which in turn had the effect of changing the magnetic properties of the films. We demonstrate control of the coercivity, which varied by a factor of more than ten. This was achieved via grain size control in CoFe films of thickness 20 nm. Furthermore, by employing a two-step sputtering process, in which two extreme growth rates are used sequentially, we were able to tune the saturation magnetization.

Item Type: Article
Copyright, Publisher and Additional Information: © 2005 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE.
Keywords: control of M(s)and H-c in CoFe films,grain size effects,high moment soft CoFe films,high target utilization sputtering technology (HiTUS),POLYCRYSTALLINE THIN-FILMS,GRAIN-SIZE
Institution: The University of York
Academic Units: The University of York > Physics (York)
Depositing User: Repository Officer
Date Deposited: 15 Dec 2006
Last Modified: 27 Jul 2016 17:30
Published Version: http://dx.doi.org/10.1109/TMAG.2005.854668
Status: Published
Refereed: Yes
URI: http://eprints.whiterose.ac.uk/id/eprint/1823

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