Femtosecond pulsed laser deposition of silicon thin films

Murray, M, Jose, G orcid.org/0000-0001-9856-6755, Richards, B orcid.org/0000-0002-1552-9244 et al. (1 more author) (2013) Femtosecond pulsed laser deposition of silicon thin films. Nanoscale Research Letters, 8 (1). e272. ISSN 1931-7573

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Copyright, Publisher and Additional Information: © 2013 Murray et al.; licensee Springer. This is an Open Access article distributed under the terms of the Creative Commons Attribution License (http://creativecommons.org/licenses/by/2.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
Keywords: Femtosecond pulsed laser deposition; Silicon thin films; Chemical vapour deposition
Dates:
  • Accepted: 26 April 2013
  • Published: 7 June 2013
Institution: The University of Leeds
Academic Units: The University of Leeds > Faculty of Engineering & Physical Sciences (Leeds) > School of Chemical & Process Engineering (Leeds)
Depositing User: Symplectic Publications
Date Deposited: 02 Apr 2019 08:05
Last Modified: 25 Jun 2023 21:15
Status: Published
Publisher: SpringerOpen
Identification Number: https://doi.org/10.1186/1556-276X-8-272
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